Effects of oxygen content on the microstructures and optical properties of thermochromic vanadium oxide thin films

Philosophical Magazine

Volumn 92, Issue 4, 2012, Pages 471-479

  Luo, Zhenfei ^a   Wu, Zhiming ^a   Wang, Tao ^a   Li, Weizhi ^a   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

microstructure; optical property; oxygen content; vanadium oxide thin film

Indexed keywords

DIRECT CURRENT MAGNETRON SPUTTERING; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FREE ELECTRON CONCENTRATION; GRAIN SIZE; IN-SITU; NEAR INFRARED REFLECTANCE; OXYGEN CONTENT; ROOM TEMPERATURE; SPECTROSCOPIC ELLIPSOMETERS; THERMAL OXIDATION; THERMO-CHROMIC; THREE-LAYER MODELS; VANADIUM OXIDE THIN FILM; VANADIUM OXIDE THIN FILMS; VANADIUM OXIDES;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; OPTICAL PROPERTIES; OXIDES; THIN FILMS; VANADIUM; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

OXYGEN;

EID: 84863155881     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786435.2011.616866     Document Type: Article

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