Growth mode and texture study in vanadium dioxide thin films deposited by magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 41, Issue 5, 2008, Pages

  Wei, Xiong Bang ^a   Wu, Zhi Ming ^a   Xu, Xiang Dong ^a   Tao Wang, ^a   Tang, Jing Jing ^a   Li, Wei Zhi ^a   Jiang, Ya Dong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; MAGNETRON SPUTTERING; SUBSTRATES; SURFACE MORPHOLOGY; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

GLASS SUBSTRATE; GROWTH MODE; REACTIVE DC MAGNETRON SPUTTERING; SQUARE RESISTANCE;

THIN FILMS;

EID: 42549150211     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/5/055303     Document Type: Article

References (22)

1. Kucharczyk D and Niklewski T 1979 J. Appl. Cryst. 12 370
2. Chiarello G et al 1996 Appl. Surf. Sci. 99 15
3. Surnev S, Ramsey M G and Netzer F P 2003 Prog. Surf. Sci. 73 117
4. Adler D 1968 Rev. Mod. Phys. 40 714
5. Ottaviano L et al 2004 Opt. Mater. 27 307
6. Tissot J L 2004 Infrared Phys. Technol. 46 147
7. Murphy D et al 2005 Proc. SPIE 5783 448
8. Takahashi K, Wang Y and Cao G Z 2005 Appl. Phys. Lett. 86 053102
9. Yamamura T, Watanabe N and Shiokawa Y 2006 J. Alloys Compounds 408-412 1260
10. Lampert C M 2003 Solar Energy Mater. Sol. Cells 76 489
11. Schlag J and Scherber W 2000 Thin Solid Films 366 28
12. Wu Z M et al 2002 Proc. 11th Int. Symp. on Electrets (Melbourne, Australia, 1-3 October 2002) p 346
13. Wu Z M et al 2003 Chin. J. Sci. Instrum. 24 237
14. Suh J Y et al 2004 J. Appl. Phys. 96 1209
15. Brassard D et al 2005 Appl. Phys. Lett. 87 051910
16. Yin D C et al 1996 J. Phys. D: Appl. Phys. 29 1051
17. Wang E G 2003 Prog. Phys. 23 1
18. Adibi F et al 1993 J. Appl. Phys. 73 8580
19. Dutta J et al 1995 J. Mater. Sci. 30 53
20. Felde B et al 1997 Thin Solid Films 305 61
21. Kulkarni A K et al 1999 Thin Solid Films 345 273
22. Knickerbocker S A 1995 PhD Dissertation Michigan Technological University