Optical and electrical properties of sputtered vanadium oxide films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 879-882

  Gan, F Y ^a   Laou, P ^a  

^a DEFENCE RESEARCH AND DEVELOPMENT CANADA VALCARTIER   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; INFRARED SPECTROMETERS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING; STOICHIOMETRY; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

DIGITAL OPTICAL SWITCHING; INSULATING STATES; METAL-INSULATION TRANSITION; METALLIC STATES;

THIN FILMS;

EID: 3142577687     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1676417     Document Type: Conference Paper

References (5)

1. F. Morin, Phys. Rev. Lett. 3, 34 (1959).
2. P. A. Cox, Transition Metal Oxides (Clarendon, Oxford, 1995).
3. C. H. Griffiths and H. K. Eastwood, J. Appl. Phys. 45, 2201 (1974).
4. H. Futaki and M. Aoki, Jpn. J. Appl. Phys., 8, 1008 (1969).
5. C. N. R. Rao, M. Matarajan, G. V. Subba Rao, and R. E. Loehman, J. Phys. Chem. Solids 32, 1147 (1971).