Fabrication of VO2 films with low transition temperature for optical switching applications

Optics Communications

Volumn 256, Issue 4-6, 2005, Pages 305-309

  Wang, Hongchen ^a,b   Yi, Xinjian ^a   Li, Yi ^a,b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Nanocrystalline vanadium dioxide; Optical switching; Phase transition; Semiconductor to metal phase transition; Vanadium dioxide film

Indexed keywords

CRYSTALLINE MATERIALS; INSERTION LOSSES; MICROMACHINING; NANOSTRUCTURED MATERIALS; OPTICAL SWITCHES; PHASE TRANSITIONS; SPUTTERING; TEMPERATURE DISTRIBUTION; VANADIUM COMPOUNDS;

METAL TARGET; NANOCRYSTALLINE VANADIUM OXIDE; OPTICAL SWITCHING; SEMICONDUCTOR-TO-METAL PHASE TRANSITION; VANADIUM DIOXIDE FILM;

METALLIC FILMS;

EID: 27744542111     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.07.005     Document Type: Article

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