Microstructures, electrical and optical properties of non-stoichiometric p-type nickel oxide films by radio frequency reactive sputtering

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 1, 2010, Pages

  Chen, S C ^a   Kuo, T Y ^a   Sun, T H ^a  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Microstructure; Nickel oxide films; O2 partial pressures; Property

Indexed keywords

CRYSTALLINITIES; ELECTRIC RESISTIVITY; ELECTRICAL AND OPTICAL PROPERTIES; LATTICE PARAMETERS; NIO FILMS; O2 PARTIAL PRESSURES; P-TYPE; PRESSURE INCREASE; PROPERTY; RADIO FREQUENCIES; RADIO-FREQUENCY REACTIVE SPUTTERING; REACTIVE MAGNETRON SPUTTERING;

ELECTRIC CONDUCTIVITY; MICROSTRUCTURE; NICKEL; NICKEL OXIDE; OPTICAL PROPERTIES; PARTIAL PRESSURE; RADIO; RADIO WAVES;

OXIDE FILMS;

EID: 78649913762     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.082     Document Type: Article

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