Etching processes of polytetrafluoroethylene surfaces exposed to He and He-O 2 atmospheric post-discharges

Langmuir

Volumn 28, Issue 25, 2012, Pages 9466-9474

  Hubert, J ^a   Dufour, T ^a   Vandencasteele, N ^a   Desbief, S ^b   Lazzaroni, R ^b   Reniers, F ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ALVEOLAR STRUCTURE; AMORPHOUS PHASE; COMPARATIVE STUDIES; ETCHING PROCESS; LAYER-BY-LAYERS; MASS LOSS; MASS-LOSS MEASUREMENT; METASTABLES; OXYGEN ATOM; OXYGEN FLOW RATES; POST-DISCHARGE; POSTDISCHARGES; PREFERENTIAL ORIENTATION; WATER CONTACT ANGLE;

ALUMINUM FOIL; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FLOW RATE; HELIUM; OXYGEN; PHOTOELECTRONS; PLASMAS; POLYTETRAFLUOROETHYLENES; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 84862868500     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la300822j     Document Type: Article

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