PTFE surface etching in the post-discharge of a scanning RF plasma torch: Evidence of ejected fluorinated species

Plasma Processes and Polymers

Volumn 9, Issue 8, 2012, Pages 820-829

  Dufour, Thierry ^a   Hubert, Julie ^a   Viville, Pascal ^b   Duluard, Corinne Y ^a   Desbief, Simon ^b   Lazzaroni, Roberto ^b   Reniers, François ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

Author keywords

hydrophobic surfaces; PTFE etching; RF plasma torch treatment; scanning RF plasma torch

Indexed keywords

ETCHING MECHANISM; HYDROPHOBIC SURFACES; MASS LOSS; OXYGEN GAS; PLASMA TREATMENT; POST-DISCHARGE; RADIO FREQUENCY PLASMA; RF PLASMA TORCH; SURFACE ETCHING; SURFACE HYDROPHOBICITY; TEXTURIZATION; WATER CONTACT ANGLE;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ETCHING; HELIUM; HYDROPHOBICITY; OXYGEN; PHOTOELECTRONS; PLASMA APPLICATIONS; PLASMA THEORY; POLYTETRAFLUOROETHYLENES; STOICHIOMETRY; SURFACE CHEMISTRY; SURFACE PROPERTIES; WAVE PLASMA INTERACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA TORCHES;

EID: 84862838312     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100209     Document Type: Article

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