Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Thin Solid Films

Volumn 520, Issue 11, 2012, Pages 3999-4002

  Du, C C ^a   Wei, T C ^b   Chang, C H ^a   Lee, S L ^a   Liang, M W ^a   Huang, J R ^a   Wu, C H ^a   Shirakura, A ^c   Morisawa, R ^d   Suzuki, T ^d  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^d KEIO UNIVERSITY   (Japan)

Author keywords

Microcrystalline silicon thin film; Optical emission spectroscopy; Process control; Tandem solar cell

Indexed keywords

CRYSTALLINITIES; EMISSION INTENSITY RATIO; FILM-DEPOSITION PROCESS; INTENSITY RATIO; MICROCRYSTALLINE SILICON THIN FILMS; OPEN LOOP SYSTEMS; OPTICAL EMISSIONS; PROCESS CONTROL TOOL; REAL-TIME PROCESS CONTROL; SPECIES CONCENTRATION; TANDEM SOLAR CELLS; UNSTABLE BEHAVIOR;

BEHAVIORAL RESEARCH; CHEMICAL VAPOR DEPOSITION; CLOSED LOOP SYSTEMS; EMISSION SPECTROSCOPY; LIGHT EMISSION; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROCESS CONTROL; VAPORS;

FILM GROWTH;

EID: 84862824383     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.08.110     Document Type: Article

References (17)

1. M. Vanecek, J. Springer, A. Poruba, O. Kluth, T. Repmann, B. Rech, N. Wyrsh, J. Meier, and A. shah K. Kurokawa, L.L. Kazmerski, B. McNelis, M. Yamaguchi, C. Wronski, W.C. Sinke, Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, May 11-18 2003 1527
2. A. Shah, J. Meier, E. Vallat-Sauvain, C. Droz, U. Kroll, N. Wyrsch, J. Guillet, and U. Graf Thin Solid Films 403-404 2002 179
3. J. Meier, S. Dubail, J. Cuperus, U. Kroll, R. Platz, P. Torres, J.A. Anna Selvan, P. Pernet, N. Beck, N. Pellaton Vaucher, Ch. Hof, D. Fischer, H. Keppner, and A. Shah J. Non-Cryst. Solids 227-230 1998 1250
4. B. Rech, O. Kluth, T. Repmann, T. Roschek, J. Springer, J. Müller, F. Finger, H. Stiebig, and H. Wagner Sol. Energy Mater. Sol. Cells 74 2002 439
5. C.R. Wronski, and R.W. Collins Sol. Energy 77 2004 877
6. D. Han, J.D. Lorentzen, J. Weinberg-Wolf, L.E. McNeil, and Q. Wang J. Appl. Phys. 94 2003 2930
7. A.D. Verkerk, J.K. Rath, and R.E.I. Schropp G. Willeke, H. Ossenbrink, P. Helm, Proceedings of the 22nd European Photovoltaic Solar Energy Conference, Milan, Italy, September 3-7 2007 1843
8. G. Dingemans, M.N. van den Donker, D. Hrunski, A. Gordijn, W.M.M. Kessels, and M.C.M. van de Sanden G. Willeke, H. Ossenbrink, P. Helm, Proceedings of the 22nd European Photovoltaic Solar Energy Conference, Milan, Italy, September 3-7 2007 1855
9. E. Katsia, E. Amanatides, D. Mataras, and D. Rapakoulias W. Hoffmann, J.-L. Bal, H. Ossenbrink, W. Palz, P. Helm, 19th European Photovoltaic Solar Energy Conference, Paris, France, June 7-11 2004 1601
10. Z. Wu, J. Sun, Q. Lei, Y. Zhao, X. Geng, and J. Xi Physica E 33 2006 125
11. L. Guo, M. Kondo, M. Fukawa, K. Saitoh, and A. Matsuda Jpn. J. Appl. Phys. 37 1998 L1116
12. Y. Fukuda, Y. Sakuma, C. Fukai, Y. Fujimura, K. Azuma, and H. Shirai Thin Solid Films 386 2001 256
13. T. Kilper, M.N. van den Donker, R. Carius, B. Rech, G. Bräuer, and T. Repmann Thin Solid Films 516 2008 4633
14. P. Torres, U. Kroll, H. Keppner, J. Meier, E. Sauvain, and A. Shah P. Fauchais, J. Amouroux, Progress in Plasma Processing of Materials 1998, Proceedings of the 5th European Conference on Thermal Plasma Processes, St Petersburg, U.S.A., July 13-16 1998 855
15. M.N. van den Donker, T. Kilper, D. Grunsky, B. Rech, L. Houben, W.M.M. Kessels, and M.C.M. van de Sanden Thin Solid Films 515 2007 7455
16. D. Ni, Y. Lou, P.D. Christofides, L. Sha, S. Lao, and J.P. Chang IEEE Trans. Semicond. Manuf. 17 2004 221
17. A.H.M. Smets, T. Matsui, and M. Kondo J. Appl. Phys. 104 2008 34508