Annealing effects on properties of LaB 6/ATO thin films deposited by magnetron sputtering

Ceramics International

Volumn 38, Issue 5, 2012, Pages 4313-4318

  Wang, Wei ^a   Yuan, Yifei ^a   Zhang, Lin ^a   Min, Guanghui ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

A. Films; C. Optical properties; Magnetron sputtering

Indexed keywords

AFTER-HEAT TREATMENT; ANNEALING EFFECTS; ANNEALING TEMPERATURES; CRYSTALLINITIES; DEPOSITION PARAMETERS; NEAR INFRARED; PRIMARY NUCLEATION; ROOM TEMPERATURE; TRANSMISSIVITY; VISIBLE REGION;

ANNEALING; MAGNETRON SPUTTERING; OPTICAL PROPERTIES;

ELECTRIC PROPERTIES;

EID: 84862812395     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.02.012     Document Type: Article

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