Fabrication of PDMS nano-stamp by replicating Si nano-moulds fabricated by interference lithography

Key Engineering Materials

Volumn 516, Issue , 2012, Pages 25-29

  Byun, Ikjoo ^a   Park, Jongho ^a   Kim, Joonwon ^b   Kim, Beomjoon ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Interference lithography (IL); Nano contact printing (NCP); Self assembled monolayer (SAM); Superhydrophobic surfaces

Indexed keywords

HYDROPHOBICITY; LITHOGRAPHY; MOLDS; NANOSTRUCTURES; PRECISION ENGINEERING; SELF ASSEMBLED MONOLAYERS; SILICONES; SURFACE PROPERTIES;

ANTIADHESION; DEEP REACTIVE ION ETCHING; INTERFERENCE LITHOGRAPHY; NANO CONTACTS; OCTADECYLTRICHLOROSILANE; SUPER-HYDROPHOBIC SURFACES;

FABRICATION;

EID: 84862735476     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.516.25     Document Type: Conference Paper

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