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Volumn 21, Issue 6, 2012, Pages

The effects of substrate temperature on ZnO-based resistive random access memory devices

Author keywords

magnetron sputtering; resistive switching devices; ZnO

Indexed keywords

FORMING PROCESS; HIGH-RESISTANCE STATE; HIGH-VOLTAGES; INITIAL STATE; LOW-RESISTANCE STATE; MULTI-STEP; OPERATION VOLTAGE; RADIO FREQUENCY MAGNETRON SPUTTERING; RESISTANCE RATIO; RESISTIVE RANDOM ACCESS MEMORY; RESISTIVE SWITCHING; RETENTION PROPERTIES; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; SWITCHING CYCLES; ZNO; ZNO THIN FILM;

EID: 84862513966     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/21/6/065201     Document Type: Article
Times cited : (17)

References (21)
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  • 2
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    • DOI 10.1038/nmat2023, PII NMAT2023
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    • Waser, R.1    Aono, M.2
  • 4
    • 11944255355 scopus 로고    scopus 로고
    • Quantized conductance atomic switch
    • DOI 10.1038/nature03190
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    • (2005) Nature , vol.433 , Issue.7021 , pp. 47-50
    • Terabe, K.1    Hasegawa, T.2    Nakayama, T.3    Aono, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.