Bipolar resistive switching in polycrystalline TiO2 films

Applied Physics Letters

Volumn 90, Issue 11, 2007, Pages

  Tsunoda, K ^a   Fukuzumi, Y ^b   Jameson, J R ^c   Wang, Z ^c   Griffin, P B ^c   Nishi, Y ^c  

^a FUJITSU LABORATORIES LTD   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTRODES; OXIDATION; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SWITCHING;

CONDUCTIVE PATH; IONIC DIFFUSION; POLYCRYSTALLINE FILMS; SWITCHING VOLTAGE; THERMAL OXIDATION;

TITANIUM DIOXIDE;

EID: 33947326575     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2712777     Document Type: Article

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