Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Surface and Coatings Technology

Volumn 206, Issue 22, 2012, Pages 4511-4517

  Musschoot, J ^a   Dendooven, J ^a   Deduytsche, D ^a   Haemers, J ^a   Buyle, G ^b   Detavernier, C ^a  

^a GHENT UNIVERSITY   (Belgium)

^b CENTEXBEL   (Belgium)

Author keywords

ALD; Atomic layer deposition; Conformality; Fibers; Plasma; Textile

Indexed keywords

ALD; CONFORMALITY; ENERGY DISPERSIVE X RAY SPECTROSCOPY; EXPOSURE TIME; FIBER SURFACE; FIBROUS MATERIAL; NON-WOVEN; OXYGEN PLASMAS; PLASMA TREATMENT; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POLYESTER FIBER; PRECURSOR MOLECULES; RADICAL RECOMBINATION; SURFACE SITES; TEST STRUCTURE;

ALUMINA; FIBERS; FILM GROWTH; NONWOVEN FABRICS; PLASMA APPLICATIONS; PLASMAS; TEXTILES; WEAVING; X RAY SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84862487270     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.02.038     Document Type: Article

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