Synthesis of V-doped TiO 2 films by chemical bath deposition and the effect of post-annealing on their properties

Thin Solid Films

Volumn 520, Issue 18, 2012, Pages 5928-5935

  Shopova Gospodinova, Denitsa ^a   Jeurgens, Lars P H ^b   Welzel, Udo ^b   Bauermann, Luciana Pitta ^a   Hoffmann, Rudolf C ^a   Bill, Joachim ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Band gap; Chemical bath deposition; V4+ doped titanium dioxide; Vanadium dioxide

Indexed keywords

AMORPHOUS COMPOSITE FILMS; AMORPHOUS OXIDE FILMS; ANNEALED FILMS; AS-DEPOSITED FILMS; CHEMICAL COMPOSITIONS; CHEMICAL-BATH DEPOSITION; CONCURRENT REDUCTION; CRYSTALLINE-TIO; DOPANT CONCENTRATIONS; EXPERIMENTAL APPROACHES; FILM SURFACES; LONG RANGE ORDERS; OPTICAL ABSORBANCE; PHASE CONSTITUTION; POST ANNEALING; TIO; ULTRA VIOLET VISIBLE SPECTROMETRY; VANADIUM DIOXIDE;

AMORPHOUS FILMS; ANNEALING; COMPOSITE FILMS; CRYSTALLINE MATERIALS; ENERGY GAP; OPTICAL BAND GAPS; OXIDE FILMS; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; TERNARY SYSTEMS; TITANIUM DIOXIDE; VANADIUM; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

FILM PREPARATION;

EID: 84862206007     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.047     Document Type: Article

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