Structural characterization of V2O5-TiO2 thin films deposited by RF sputtering from a titanium target with vanadium insets

Sensors and Actuators, B: Chemical

Volumn 109, Issue 1, 2005, Pages 47-51

  Alessandri, Ivano ^a   Comini, Elisabetta ^a   Bontempi, Elza ^a   Sberveglieri, Giorgio ^a   Depero, Laura E ^a  

^a UNIVERSITY OF BRESCIA   (Italy)

Author keywords

Gas sensors; Insets deposition; MicroXRF; Ti V O thin films; XRD

Indexed keywords

CHEMICAL SENSORS; DEPOSITION; FLUORESCENCE; HEAT TREATMENT; MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROMETRY; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

INSETS DEPOSITION; MICROXRF; TI-V-O THIN FILMS; X-RAY FLUORESCENCE (XRF);

THIN FILMS;

EID: 22944458221     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2005.03.080     Document Type: Article

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