Phase transition behavior in microcantilevers coated with M 1-phase VO 2 and M 2-phase VO 2:Cr thin films

Journal of Applied Physics

Volumn 111, Issue 10, 2012, Pages

  Rúa, Armando ^a,b   Cabrera, Rafmag ^c   Coy, Horacio ^a   Merced, Emmanuelle ^c   Sepúlveda, Nelson ^c   Fernández, Félix E ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b CITY UNIVERSITY OF NEW YORK   (United States)

^c Michigan State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PERCENT; BULK DENSITY; CANTILEVER TIP; CR-DOPED; DEVICE APPLICATION; DIFFERENTIAL THERMAL EXPANSION; FUNDAMENTAL RESONANT FREQUENCIES; HIGH RESISTIVITY; INSULATOR-TO-METAL TRANSITIONS; MECHANICAL CHARACTERISTICS; MICRO-CANTILEVERS; MICRO-ELECTRO-MECHANICAL; MULTIFUNCTIONALITY; OPTOMECHANICAL; R PHASE; RESONANT FREQUENCY CHANGE; ROOM TEMPERATURE; SILICON MICROCANTILEVERS; SILICON SUBSTRATES; TEMPERATURE RANGE; TRANSITION BEHAVIOR; VANADIUM DIOXIDE; YOUNG'S MODULUS;

COMPOSITE MICROMECHANICS; ELASTIC MODULI; ELASTICITY; NANOCANTILEVERS; NATURAL FREQUENCIES; OXIDE MINERALS; PULSED LASER DEPOSITION; TEMPERATURE; VANADIUM;

CHROMIUM;

EID: 84862121940     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4716191     Document Type: Conference Paper

References (41)

1. M. Marezio, D. B. Mcwhan, J. P. Remeika, and P. D. Dernier, Phys. Rev. B 5, 2541 (1972). 10.1103/PhysRevB.5.2541
2. W. Brückner, U. Gerlach, W. Moldenhauer, H. P. Bruckner, B. Thuss, H. Opperman, E. Wolf, and I. Storbeck, J. Phys. Colloq. 37, 63 (1976). 10.1051/jphyscol:1976410
3. B. L. Chamberland, J. Solid State Chem. 7, 377 (1973). 10.1016/0022-4596(73)90166-7
4. J. P. Pouget, H. Launois, J. P. D'Haenens, P. Merenda, and T. M. Rice. Phys. Rev. Lett. 35, 873 (1975). 10.1103/PhysRevLett.35.873
5. H. Guo, K. Chen, Y. Oh, K. Wang, C. Dejoie, S. A Syed Asif, O. L. Warren, Z. W. Shan, J. Wu, and A. M. Minor, Nano Lett. 11, 3207 (2011). 10.1021/nl201460v
6. D. H. Kim and H. S. Kwok, Appl. Phys. Lett. 65, 3188 (1994). 10.1063/1.112476
7. Z. P. Wu, A. Miyashita, I. Nashiyama, and H. Naramomoto, Philos. Mag. Lett. 79, 813 (1999). 10.1080/095008399176634
8. F. Beteille and J. Livage, J. Sol-Gel Sci. Technol. 13, 915 (1998). 10.1023/A:1008679408509
9. P. Jin, S. Nakao, and S. Tanemura, Thin Solid Films 324, 151 (1998). 10.1016/S0040-6090(98)00362-9
10. Z. P. Wu, A. Miyashita, S. Yamamoto, H. Abe, I. Nashiyama, K. Narumi, and H. Naramoto, J. Appl. Phys. 86, 5311 (1999). 10.1063/1.371519
11. M. J. Lachut and J. E. Sader, Phys. Rev. Lett. 99, 206102 (2007). 10.1103/PhysRevLett.99.206102
12. Mikromasch model CSC12 tipless cantilevers, Mikromasch, Tallinn, Estonia.
13. N. Sepúlveda, A. Rúa, R. Cabrera, and F. Fernández, Appl. Phys. Lett. 92, 191913 (2008). 10.1063/1.2926681
14. J. B. MacChesney and H. J. Guggenheim, J. Phys. Chem. Solids 30, 225 (1969). 10.1016/0022-3697(69)90303-5
15. G. Villeneuve, A. Bordet, A. Casalot, and P. Hagenmuller, Mater. Res. Bull. 6, 119 (1971). 10.1016/0025-5408(71)90096-1
16. D. Maurer, A. Leue, R. Reichele, and V. Müller, Phys. Rev. B 60, 13249 (1999); 10.1103/PhysRevB.60.13249
17. D. Maurer and A. Leue, Mater. Sci. Eng., A 370, 440 (2004); 10.1016/j.msea.2003.05.002
18. P. Schilbe and D. Maurer, Mater. Sci. Eng., A 370, 449 (2004). 10.1016/j.msea.2003.08.114
19. W. Brückner, W. Moldenhauer, H. Wich, E. Wolf, H. Opperman, U. Gerlach, and W. Reichelt, Phys. Status Solidi A 29, 63 (1975). 10.1002/pssa.2210290107
20. A. Rúa, F. E. Fernández, and N. Sepúlveda, J. Appl. Phys. 107, 074506 (2010). 10.1063/1.3369282
21. S. Timoshenko, Vibration Problems in Engineering, 2nd ed. (D. Van Nostrand Co., 1937).
22. Q.-M. Wang and L. E. Cross, Ferroelectrics 215, 187 (1998). 10.1080/00150199808229562
23. W. Young and R. Budynas, Roark's Formulas for Stress and Strain, 7th ed. (McGraw-Hill, 2001), p. 137.
24. Q. M. Wang and L. E. Cross, J. Appl. Phys. 83, 5358 (1998). 10.1063/1.367364
25. N. Ono, K. Kitamura, K. Nakajima, and Y. Shimanuki, Jpn. J. Appl. Phys. Part 1 39, 368 (2000). 10.1143/JJAP.39.368
26. J. F. Nye, Physical Properties of Crystals, 2nd ed. (Oxford University Press, 1985), p. 140.
27. M. Guntersdorfer, Solid-State Electron. 13, 355 (1970). 10.1016/0038-1101(70)90186-3
28. P. Jin, S. Nakao, S. Tanemura, T. Bell, L. S. Wielunski, and M. V. Swain, Thin Solid Films 343-344, 134 (1999). 10.1016/S0040-6090(98)01646-0
29. K. Y. Tsai, T. S. Chin, and H. P. Shieh, Jpn. J. Appl. Phys. Part 1 43, 6268 (2004). 10.1143/JJAP.43.6268
30. W. Fan, S. Huang, J. Cao, E. Ertekin, C. Barrett, D. R. Khanal, J. C. Grossman, and J. Wu, Phys. Rev. 80, 241105(R) (2009). 10.1103/PhysRevB.80.241105
31. B. S. Guiton, Q. Gu, A. L. Prieto, M. S. Gudiksen, and H. Park, J. Am. Chem. Soc. 127, 498 (2005). 10.1021/ja045976g
32. J. Wu, Q. Gu, B. Guiton, N. de Leon, L. Ouyang, and H. Park, Nano Lett. 6, 2313 (2006). 10.1021/nl061831r
33. J. Wei, Z. Wang, W. Chen, and D. H. Cobden, Nat. Nanotechnol. 4, 420 (2009). 10.1038/nnano.2009.141
34. A. C. Jones, S. Berweger, J. Wei, D. Cobden, and M. B. Raschke, Nano Lett. 10, 1574, (2010). 10.1021/nl903765h
35. Powder Diffraction Files 76-0674 and 76-0675, International Centre for Diffraction Data, Newtown Square, PA.
36. J. Cao, W. Fan, Q. Zhou, E. Sheu, A. Liu, C. Barrett, and J. Wu, J. Appl. Phys. 108, 083538 (2010). 10.1063/1.3501052
37. R. Cabrera, E. Merced, N. Sepúlveda, and F. E. Fernández, J. Appl. Phys. 110, 094510 (2011). 10.1063/1.3658776
38. S. Timoshenko, J. Opt. Soc. Am. 11, 233 (1925). 10.1364/JOSA.11.000233
39. D. Kucharczyk and T. Niklewski, J. Appl. Crystallogr. 12, 370 (1979). 10.1107/S0021889879012711
40. Y. Okada and Y. Tokumaru, J. Appl. Phys. 56, 314 (1984). 10.1063/1.333965
41. J. M. Reyes, G. F. Lynch, M. Sayer, S. L. McBride, and T. S. Hutchison, J. Can. Ceram. Soc. 41, 69 (1972).