Tungsten doping into vanadium dioxide thermochromic films by high-energy ion implantation and thermal annealing

Thin Solid Films

Volumn 324, Issue 1-2, 1998, Pages 151-158

  Jin, P ^a   Nakao, S ^a   Tanemura, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ion implantation; Thermochromic; Thin films; Tungsten doping; Vanadium dioxide

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); ION IMPLANTATION; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; THIN FILMS; TUNGSTEN; VANADIUM COMPOUNDS;

THERMOCHROMISM; VANADIUM DIOXIDE;

METALLIC FILMS;

EID: 0032124282     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00362-9     Document Type: Article

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