Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing

Thin Solid Films

Volumn 520, Issue 17, 2012, Pages 5589-5592

  Koseva, R ^a   Monch I ^a   Meier, D ^b   Schumann, J ^a   Arndt, K F ^c   Schultz, L ^b   Zhao, B ^d   Schmidt, O G ^a  

^a IFW DRESDEN   (Germany)

^b Institute for Metallic Materials   (Germany)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^d SHANGHAI INSTITUTE OF APPLIED PHYSICS   (China)

Author keywords

Bismuth; Hall sensors; Hillocks; Nanoscale mechanical polishing; Thin films

Indexed keywords

ACTIVE AREA; BI FILMS; BI THIN FILMS; BISMUTH THIN FILMS; CRYSTALLINE STRUCTURE; DEVICE PERFORMANCE; ELECTRON BEAM EVAPORATION; HALL PROBE; HALL SENSOR; HIGH QUALITY; HILLOCKS; MECHANICAL POLISHING; NANO SCALE; SI SUBSTRATES;

BISMUTH; ELECTRON BEAMS; HALL EFFECT TRANSDUCERS; NANOTECHNOLOGY; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS;

POLISHING;

EID: 84861833583     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.04.040     Document Type: Article

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