Spontaneous hillock growth on indium film surface

Chinese Physics Letters

Volumn 23, Issue 7, 2006, Pages 1880-1883

  Wei, He Lin ^a   Zhang, Xi Xiang ^b   Huang, Han Chen ^c  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^c RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INDIUM; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

COALESCENT PROCESS; D.C. MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING; DEPOSITION TIME; DRIVE FORCE; FILM SURFACES; HILLOCK GROWTH; LOW MELTING POINT; SCANNING ELECTRON MICROSCOPY IMAGE; SILICON SUBSTRATES;

COMPRESSIVE STRESS;

EID: 33745597618     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/7/062     Document Type: Article

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