Temperature-sensitive hydrogel pattern by electron-beam lithography

Macromolecular Materials and Engineering

Volumn 291, Issue 7, 2006, Pages 755-761

  Schmidt, Thomas ^a   Mönch, Jens Ingolf ^b   Arndt, Karl Friedrich ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

Cross linking; Electron beam irradiation; Patterning; Poly(vinyl methyl ether); Temperature sensitive hydrogel

Indexed keywords

CROSSLINKING; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRON MICROSCOPES; ION BEAM LITHOGRAPHY;

ELECTRON BEAM IRRADIATION; PATTERNING; POLY(VINYL METHYL ETHER); TEMPERATURE SENSITIVE HYDROGEL;

HYDROGELS;

EID: 33746349267     PISSN: 14387492     EISSN: 14392054     Source Type: Journal    
DOI: 10.1002/mame.200600057     Document Type: Article

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