Patterning of thin poly(N-vinyl pyrrolidone) films on silicon substrates by electron beam lithography

Journal of Applied Polymer Science

Volumn 106, Issue 1, 2007, Pages 534-539

  Burkert, Sina ^a   Schmidt, Thomas ^b   Gohs, Uwe ^a   Mönch, Ingolf ^c   Arndt, Karl Friedrich ^b  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c IFW DRESDEN   (Germany)

Author keywords

Electron beam irradiation; Hydrogels; Lithography; Swelling; Thin films

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; HYDROGELS; SUBSTRATES; SWELLING;

CROSSLINKING BEHAVIOR; ELECTRON BEAM IRRADIATION;

THIN FILMS;

CROSS LINKING; FILM; HYDROGEL; IRRADIATION; SILICON; SUBSTRATE;

EID: 34548514486     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.26592     Document Type: Article

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