Tunable resonance frequency of FeNi films by oblique sputtering

Journal of Magnetism and Magnetic Materials

Volumn 324, Issue 18, 2012, Pages 2899-2901

  Zhu, Xiaoqiang ^a   Wang, Zhenkun ^a   Zhang, Yi ^a   Xi, Li ^a   Wang, Jianbo ^a   Liu, Qingfang ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

FeNi thin film; Magnetic resonant; Magnetron sputtering

Indexed keywords

DYNAMIC PROPERTY; FENI FILMS; MAGNETIC RESONANT; OBLIQUE ANGLES; OBLIQUE SPUTTERING; RADIO FREQUENCY MAGNETRON SPUTTERING; RESONANCE FREQUENCIES; SI (1 1 1); UNIAXIAL MAGNETIC ANISOTROPY; WIDE FREQUENCY RANGE;

MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; THIN FILMS;

NATURAL FREQUENCIES;

EID: 84861761191     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2012.04.035     Document Type: Article

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