Effects of substrate temperature and annealing on the anisotropic magnetoresistive property of NiFe films

Rare Metals

Volumn 22, Issue 3, 2003, Pages 202-205

  Wu, Ping ^a,b   Wang, Fengping ^a,b   Qiu, Hong ^a,b   Pan, Liqing ^a,b   Tian, Yue ^a,b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b Beijing Keda Tianyu MMTDCL   (China)

Author keywords

Anisotropic magnetoresistance; Condensed matter physics; Magnetics; Magnetron sputtering; NiFe film

Indexed keywords

ANNEALING; IRON COMPOUNDS; MAGNETORESISTANCE; MAGNETRON SPUTTERING; NICKEL COMPOUNDS;

ANISOTROPIC MAGNETORESISTANCE; CONDENSED MATTER PHYSICS; SUBSTRATE TEMPERATURE; THERMAL OXIDIZED SILICON SUBSTRATES;

MAGNETIC FILMS;

EID: 1342306518     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. Valletta R.M., Guthmiller G., and German G., Relation of thickness and some physical properties of NiFe thin films [J], J. Vac. Sci. Technol., 1991, A9 (4): 2093.
2. Hauser H., Hochreiter J., Stangl G., Chabicovsky R., Janiba M., and Riedling K., Anisotropic magnetore-sistance effect field sensors [J], J. Mag. Mag. Mater., 2000, 215: 788.
3. Bruckner W., Thomas J., and Schneider C.M., Evolution of stress and microstructure in NiFe (20wt.% ) thin films during annealing [J], Thin Solid Films, 2001, 385: 225.
4. Miyazaki T., Ajima T., and Sato E, Dependence of magentoresistance on thickness and substrate temperature for 82Ni-Fe alloy film [J], J. Mag. Mag. Mater., 1989, 81: 86.
5. Mao M., Leng Q., Huai Y., Johnson P., Miller M., Tong H.C., Miloslavsky L., and Qian C., Characterization of ion beam and magnetron sputtered thin Ta/NiFe films [J], J. Appl. Phys., 1999, 85(8): 5780.