Dual frequency open-loop electric potential microscopy for local potential measurements in electrolyte solution with high ionic strength

Review of Scientific Instruments

Volumn 83, Issue 3, 2012, Pages

  Kobayashi, Naritaka ^a   Asakawa, Hitoshi ^a   Fukuma, Takeshi ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATION RANGE; BIAS MODULATION; DUAL FREQUENCY; ELECTROCHEMICAL REACTIONS; ELECTROLYTE SOLUTIONS; FREQUENCY COMPONENTS; GRAPHITE SURFACES; HIGH IONIC STRENGTH; NACL SOLUTION; OPEN LOOPS; OPERATING ENVIRONMENT; POTENTIAL DISTRIBUTIONS; POTENTIAL MEASUREMENTS; SINGLE FREQUENCY; SOLID/LIQUID INTERFACES; STRONG ELECTROLYTE SOLUTIONS; WEAK ELECTROLYTES;

ELECTRIC POTENTIAL; IONIC STRENGTH; SODIUM CHLORIDE;

ELECTROLYTES;

ELECTROLYTE; SODIUM CHLORIDE;

ARTICLE; CHEMISTRY; ELECTROMAGNETIC FIELD; INSTRUMENTATION; METHODOLOGY; MICROSCOPY; OSMOLARITY; SOLUTION AND SOLUBILITY; STATIC ELECTRICITY;

ELECTROLYTES; ELECTROMAGNETIC PHENOMENA; MICROSCOPY; OSMOLAR CONCENTRATION; SODIUM CHLORIDE; SOLUTIONS; STATIC ELECTRICITY;

EID: 84861605123     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3698207     Document Type: Review

References (20)

1. R. Sennett and J. P. Olivier, Ind. Eng. Chem. 57, 32 (1965). 10.1021/ie50668a007
2. H. J. Butt, B. Cappella, and M. Kappl, Surf. Sci. Rep. 59, 1 (2005). 10.1016/j.surfrep.2005.08.003
3. D. Ebeling, D. van den Ende, and Frieder Mugele, Nanotechnology 22, 305706 (2011). 10.1088/0957-4484/22/30/305706
4. M. Nonnenmacher, M. P. O'Boyle, and H. K. Wickramasinghe, Appl. Phys. Lett. 58, 2921 (1991). 10.1063/1.105227
5. S. Kitamura and M. Iwatsuki, Appl. Phys. Lett. 72, 3154 (1998). 10.1063/1.121577
6. Y. Rosenwaks, R. Shikler, Th. Glatzel, and S. Sadewasser, Phys. Rev. B 70, 085320 (2004). 10.1103/PhysRevB.70.085320
7. T. Fukuma, K. Umeda, K. Kobayashi, H. Yamada, and K. Matsushige, Jpn. J. Appl. Phys. 41, 4903 (2002). 10.1143/JJAP.41.4903
8. C. Leung, H. Kinns, B. W. Hoogenboom, S. Howorka, and P. Mesquida, Nano Lett. 9, 2769 (2009). 10.1021/nl9012979
9. N. Kobayashi, H. Asakawa, and T. Fukuma, Rev. Sci. Instrum. 81, 123705 (2010). 10.1063/1.3514148
10. H. Asakawa, N. Kobayashi, and T. Fukuma, J. Appl. Phys. 110, 044315 (2011). 10.1063/1.3625230
11. C. Hutter, D. Platz, E. A. Tholn, T. H. Hansson, and D. B. Haviland, Phys. Rev. Lett. 104, 050801 (2010). 10.1103/PhysRevLett.104.050801
12. D. Martinez-Martin, E. T. Herruzo, C. Dietz, J. Gomez-Herrero, and R. Garcia, Phys. Rev. Lett. 106, 198101 (2011). 10.1103/PhysRevLett.106.198101
13. T. Fukuma, M. Kimura, K. Kobayashi, K. Matsushige, and H. Yamada, Rev. Sci. Instrum. 76, 053704 (2005). 10.1063/1.1896938
14. T. Fukuma and S. P. Jarvis, Rev. Sci. Instrum. 77, 043701 (2006). 10.1063/1.2188867
15. T. Fukuma, Rev. Sci. Instrum. 80, 023707 (2009). 10.1063/1.3086418
16. C. C. Williams, Y. Martin, and H. K. Wickramasinghe, J. Appl. Phys. 61, 4723 (1987). 10.1063/1.338807
17. D. Horne, T. R. Albrecht, P. Grutter, and D. Rugar, J. Appl. Phys. 69, 668 (1991). 10.1063/1.347347
18. J. I. Kilpatrick, T. Fukuma, and S. P. Jarvis, Rev. Sci. Instrum. 77, 123703 (2006). 10.1063/1.2405361
19. S. Ishizaki, N. Umeda, and H. Uwai, J. Vac. Sci. Technol. B 9, 1318 (1991). 10.1116/1.585187
20. K. Umeda, N. Oyabu, K. Kobayashi, K. Matsushige, and H. Yamada, Appl. Phys. Express 3, 065205 (2010). 10.1143/APEX.3.065205