Quantification of shot noise contributions to contact hole local cd non-uniformity

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8322, Issue , 2012, Pages

  Gronheid, Roel ^a   Winroth, Gustaf ^a   Pret, Alessandro Vaglio ^a,b   Younkin, Todd R ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c INTEL CORPORATION   (United States)

Author keywords

CDU; EUVL; Lithography simulation; Negative tone; Positive tone; Shot noise; Stochastic modeling

Indexed keywords

CDU; LITHOGRAPHY SIMULATION; NEGATIVE TONES; POSITIVE TONE; STOCHASTIC MODELING;

EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTONS; SHOT NOISE; STOCHASTIC MODELS;

LITHOGRAPHY;

EID: 84861502453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916681     Document Type: Conference Paper

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