Transparent conductive p-type lithium-doped nickel oxide thin films deposited by pulsed plasma deposition

Applied Surface Science

Volumn 258, Issue 19, 2012, Pages 7435-7439

  Huang, Yanwei ^a,b   Zhang, Qun ^b   Xi, Junhua ^a   Ji, Zhenguo ^a  

^a HANGZHOU DIANZI UNIVERSITY   (China)

^b FUDAN UNIVERSITY   (China)

Author keywords

Electrical and optical properties; Lithium doped nickel oxide; p n Junction; p Type; Transparent conductive oxide

Indexed keywords

CONDUCTIVE FILMS; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC CONDUCTIVITY; LITHIUM COMPOUNDS; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; PLASMA DEPOSITION; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; THIN FILMS;

ELECTRICAL AND OPTICAL PROPERTIES; LITHIUM-DOPED NICKEL OXIDES; P-N JUNCTION; P-TYPE; TRANSPARENT CONDUCTIVE OXIDES;

OPTICAL FILMS;

EID: 84861341910     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.04.057     Document Type: Article

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