Thickness dependence of electrical and optical properties of sputtered Nickel oxide films (DOI:10.1016/j.tsf.2005.07.124)

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 361-365

  Chen, Hao Long ^a   Lu, Yang Ming ^b   Hwang, Weng Sing ^c  

^a KAO YUAN UNIVERSITY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electrical properties and measurements; Hall effects; Nickel oxide; Optical properties; Sputtering; Thickness

Indexed keywords

EID: 33745893847     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.04.041     Document Type: Erratum

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