SCOPUS 정보 검색 플랫폼

IOP Conference Series: Materials Science and Engineering

Volumn 34, Issue 1, 2012, Pages

The effect of Substrate temperature on physical and electrical properties of DC magnetron sputtered (Ta 2O 5) 0.85(TiO 2) 0.15 films

(5) Sekhar, M Chandra a Uthanna, S a Martins, R b Chandra, S V Jagadeesh b Elangovan, E b

a SRI VENKATESWARA UNIVERSITY (India)

b Center of Excellence in Microelectronics Optoelectronics and Processes (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION MECHANISM; DC REACTIVE MAGNETRON SPUTTERING; DIFFERENT SUBSTRATES; LOW-LEAKAGE CURRENT; POOLE-FRENKEL; SCHOTTKY EMISSIONS; STRUCTURAL CHANGE; SUBSTRATE TEMPERATURE; TIO;

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRIC PROPERTIES; ELECTROLYTIC CAPACITORS; MOS CAPACITORS; QUARTZ; SEMICONDUCTING SILICON; SILICON; TANTALUM OXIDES; TITANIUM DIOXIDE;

SUBSTRATES;

EID: 84861316135 PISSN: 17578981 EISSN: 1757899X Source Type: Conference Proceeding
DOI: 10.1088/1757-899X/34/1/012009 Document Type: Conference Paper

Times cited : (5)

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