Electrostatic properties of organic monolayers on silicon oxides studied by kelvin probe force microscopy

Japanese Journal of Applied Physics

Volumn 51, Issue 4 PART 1, 2012, Pages

  Mishima, Ryota ^a   Loan, Ngyuen Thu ^a   Tada, Hirokazu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL CHAIN; CHEMICAL SPECIES; ELECTROSTATIC PROPERTIES; KELVIN PROBE FORCE MICROSCOPY; ORGANIC MONOLAYERS; PENTACENES; PERYLENETETRACARBOXYLIC DIIMIDES; PTCDI-C13; STRUCTURAL ASYMMETRY; VACUUM LEVEL;

CHARGE TRANSFER; MOLECULES; PROBES; SILICON OXIDES;

MONOLAYERS;

EID: 84860477463     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.045702     Document Type: Article

References (32)

1. H. Ishii, K. Sugiyama, E. Ito, and K. Seki: Adv. Mater. 11 (1999) 605.
2. D. Cahen and A. Kahn: Adv. Mater. 15 (2003) 271.
3. N. Koch: Chem. Phys. Chem. 8 (2007) 1438.
4. N. Koch, A. Vollmer, S. Duhm, Y. Sakamoto, and T. Suzuki: Adv. Mater. 19 (2007) 112.
5. S. Duhm, G. Heimel, I. Salzmann, H. Glowatzki, R. L. Johnson, A. Vollmer, J. P. Rabe, and N. Koch: Nat. Mater. 7 (2008) 326.
6. S. Braun, W. R. Salaneck, and M. Fahlman: Adv. Mater. 21 (2009) 1450.
7. V. Papaefthimiou, A. Siokou, and S. Kennou: Thin Solid Films 459 (2004) 32.
8. V. Papaefthimiou, A. Siokou, and S. Kennou: Surf. Sci. 569 (2004) 207.
9. L. Chen, R. Ludeke, X. Cui, A. G. Schrott, C. R. Kagan, and L. E. Brus: J. Phys. Chem. B 109 (2005) 1834.
10. L. Chen, O. Cherniavskaya, A. Shalek, and L. E. Brus: Nano Lett. 5 (2005) 2241.
11. K. Puntambekar, J. Dong, G. Haugstad, and C. D. Frisbie: Adv. Funct. Mater. 16 (2006) 879.
12. S. A. Burke, J. M. LeDue, Y. Miyahara, J. M. Topple, S. Fostner, and P. Grü tter: Nanotechnology 20 (2009) 264012.
13. J. Alexander and S. Magonov: J. Vac. Sci. Technol. B 27 (2009) 903.
14. H. Sugimura, K. Hayashi, N. Saito, N. Nakagiri, and O. Takai: Appl. Surf. Sci. 188 (2002) 403.
15. S. E. Fritz, S. M. Martin, C. D. Frisbie, M. D. Ward, and M. F. Toney: J. Am. Chem. Soc. 126 (2004) 4084.
16. S. D. Wang, X. Dong, C. S. Lee, and S. T. Lee: J. Phys. Chem. B 109 (2005) 9892.
17. A. Hinderhofer, U. Heinemeyer, A. Gerlach, S. Kowarik, R. M. J. Jacobs, Y. Sakamoto, T. Suzuki, and F. Schreiber: J. Chem. Phys. 127 (2007) 194705.
18. S. Schiefer, M. Huth, A. Dobrinevski, and B. Nickel: J. Am. Chem. Soc. 129 (2007) 10316.
19. D. Nabok, P. Puschnig, C. Ambrosch-Draxl, O. Werzer, R. Resel, and D.-M. Smilgies: Phys. Rev. B 76 (2007) 235322.
20. Y. Sakamoto, T. Suzuki, M. Kobayashi, Y. Gao, Y. Fukai, Y. Inoue, F. Sato, and S. Tokito: J. Am. Chem. Soc. 126 (2004) 8138.
21. S. A. Burke, J. M. Topple, and P. Grü tter: J. Phys.: Condens. Matter 21 (2009) 423101.
22. S. Kowarik, A. Gerlach, A. Hinderhofer, S. Milita, F. Borgatti, F. Zontone, T. Suzuki, F. Biscarini, and F. Schreiber: Phys. Status Solidi: Rapid Res. Lett. 2 (2008) 120.
23. T. V. Deasai, A. R. Woll, F. Schreiber, and J. R. Engstrom: J. Phys. Chem. C 114 (2010) 20120.
24. Y. Inoue, Y. Sakamoto, T. Suzuki, M. Kobayashi, Y. Gao, and S. Tokito: Jpn. J. Appl. Phys. 44 (2005) 3663.
25. T. Yokoyama, C. B. Park, T. Nishimura, K. Kita, and A. Toriumi: Jpn. J. Appl. Phys. 47 (2008) 3643.
26. S. Duhm, I. Salzmann, G. Heimel, M. Oehzelt, A. Haase, R. L. Johnson, J. P. Rabe, and N. Koch: Appl. Phys. Lett. 94 (2009) 033304.
27. M. G. Helander, Z. B. Wang, J. Qiu, and Z. H. Lu: Appl. Phys. Lett. 93 (2008) 193310.
28. Y.-C. Yeo, T.-J. King, and C. Hu: J. Appl. Phys. 92 (2002) 7266.
29. S. Tatemichi, M. Ichikawa, T. Koyama, and Y. Taniguchi: Appl. Phys. Lett. 89 (2006) 112108.
30. J. O. Vogel, I. Salzmann, R. Opitz, S. Duhm, B. Nickel, J. P. Rabe, and N. Koch: J. Phys. Chem. B 111 (2007) 14097.
31. A. S. Wan, J. P. Long, G. Kushto, and A. J. Mäkinen: Chem. Phys. Lett. 463 (2008) 72.
32. T. N. Krauss, E. Barrena, D. G. de Oteyza, X. N. Zhang, J. Major, V. Dehm, F. Würthner, and H. Dosch: J. Phys. Chem. C 113 (2009) 4502.