Structural ordering in a silica glass matrix under Mn ion implantation

Journal of Physics Condensed Matter

Volumn 24, Issue 18, 2012, Pages

  Zatsepin, D A ^a,b   Green, R J ^c   Hunt, A ^c   Kurmaev, E Z ^b   Gavrilov, N V ^d   Moewes, A ^c  

^a URAL FEDERAL UNIVERSITY   (Russian Federation)

^b INSTITUTE OF METAL PHYSICS   (Russian Federation)

^c UNIVERSITY OF SASKATCHEWAN   (Canada)

^d INSTITUTE OF ELECTROPHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; ELECTRONIC STRUCTURE; EMISSION SPECTROSCOPY; ION IMPLANTATION; MANGANESE OXIDE; SILICA; SILICON; X RAY ABSORPTION; X RAY DIFFRACTION; X RAYS;

CRYSTALLINITIES; IMPLANTATION PROCESS; LONG RANGE ORDERS; NEAR SURFACE REGIONS; SILICA GLASS MATRIX; SOFT-X-RAY ABSORPTION; STRUCTURAL ORDERING; THERMAL-ANNEALING;

MANGANESE;

EID: 84859924292     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/24/18/185402     Document Type: Article

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