Titanium implantation in bulk and thin film amorphous silica

Journal of Applied Physics

Volumn 83, Issue 10, 1998, Pages 5150-5153

  Tisserand, Stéphane ^a   Flory, François ^a   Gatto, Alexandre ^a   Roux, Laurent ^b   Adamik, Miklos ^c   Kovacs, Istvan ^c  

^a Ecole Centrale Marseille   (France)

^b Z A Les Pradeaux   (France)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005052481     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367332     Document Type: Article

References (11)

1. P. D. Townsend, P. J. Chandler, and L. Zhang, in Optical Effects of Ion Implantation, Cambridge Studies in Modern Optics (Cambridge University Press, Cambridge, 1994), p. 196.
2. P-N. Favennec, in L'implantation ionique pour la microélectronique et l'optique. Collection Technique et Scientifique des Télécommunications (Masson, Paris, 1993), p. 347.
3. E. P. EerNisse, J. Appl. Phys. 45, 167 (1974).
4. G. W. Arnold, Radiat. Eff. 65, 17 (1982).
5. J-Y. Le Guen, (private communication).
6. F. Flory, D. Berthier, H. Rigneault, and L. Roux, Appl. Opt. 35, 5085 (1996).
7. B. G. Bovard, in Thin Films for Optical Systems, edited by F. R. Flory (Dekker, New York, 1995), p. 117.
8. R. Ulrich and R. Torge, Appl. Opt. 12, 2901 (1973).
9. F. R. Flory, in Ref. 7, p. 393.
10. A. C. Boccara, D. Fournier, W. B. Jackson, and N. M. Amer, Opt. Lett. 5, 377 (1979).
11. M. Commandré and P. Roche, Appl. Opt. 35, 5021 (1996).