Deposition of carbon based materials by continuous and pulsed discharges

Surface Engineering

Volumn 28, Issue 2, 2012, Pages 141-148

  Cicala, G ^a  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

Author keywords

Continuous and pulsed plasmas; Microwave CH 4 H 2 and radio frequency C 2F 4 discharges; Polycrystalline diamond and fluorocarbon films

Indexed keywords

CARBON BASED MATERIALS; CONTINUOUS FILMS; DUTY CYCLES; FILM MORPHOLOGY; FLUOROCARBON FILMS; GAS-SURFACE INTERACTION; GROWTH CHEMISTRY; GROWTH PRECURSORS; MATERIAL PROPERTY; POLYCRYSTALLINE DIAMONDS; POWER MODULATION; PULSE PERIOD; PULSED DISCHARGE; PULSED PLASMA; QUALITY FACTORS; RADIO FREQUENCIES; STRUCTURE AND MORPHOLOGY; SUPERHYDROPHOBIC; WATER CONTACT ANGLE;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOELECTRONS; PLASMAS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 84859745001     PISSN: 02670844     EISSN: 17432944     Source Type: Journal    
DOI: 10.1179/1743294411Y.0000000080     Document Type: Article

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