Study of polycrystalline diamond deposition by continuous and pulsed discharges

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1884-1888

  Cicala, G ^a   Brescia, R ^a   Nitti, M A ^b   Romeo, A ^b   Altamura, D ^a   Giannini, C ^a   Capitelli, M ^b   Spinelli, P ^b   Schutzmann, S ^c  

^a CNR   (Italy)

^b UNIVERSITY OF BARI   (Italy)

^c LOT Oriel Italia srl   (Italy)

Author keywords

MWPECVD; Polycrystalline diamond film; Pulsed mode

Indexed keywords

CRYSTALLITE ORIENTATION; DUTY CYCLES; EXTINCTION COEFFICIENTS; MICROWAVE POWER; POLYCRYSTALLINE DIAMOND FILMS; POLYCRYSTALLINE DIAMONDS; PULSE DURATIONS; PULSE FREQUENCIES; PULSED DISCHARGE; PULSED MICROWAVE DISCHARGES; PULSED MODE; PYROMETRIC INTERFEROMETRY; SUBSTRATE TEMPERATURE;

DIAMOND CUTTING TOOLS; DIAMOND DEPOSITS; DIAMONDS; ELECTRIC DISCHARGES; MICROWAVES; REFRACTIVE INDEX;

DIAMOND FILMS;

EID: 76349114723     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.001     Document Type: Article

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