Low-loss polysilicon waveguides fabricated in an emulated high-volume electronics process

Optics Express

Volumn 20, Issue 7, 2012, Pages 7243-7254

  Orcutt, Jason S ^a   Tang, Sanh D ^b   Kramer, Steve ^b   Mehta, Karan ^a   Li, Hanqing ^a   Stojanović, Vladimir ^a   Ram, Rajeev J ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC LOSSES; POLYSILICON;

1550 NM; ABSORPTION MODEL; DEFECT STATE; END-OF-LINE; LOSS MECHANISMS; LOW LOSS; MATERIAL LOSS; PRODUCT INTEGRATION; WAVEGUIDE CHARACTERISTIC; WAVEGUIDE PROPAGATION;

WAVEGUIDES;

SILICON;

ARTICLE; CHEMISTRY; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; REFRACTOMETRY; SURFACE PLASMON RESONANCE; TELECOMMUNICATION;

ELECTRONICS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; REFRACTOMETRY; SILICON; SURFACE PLASMON RESONANCE; TELECOMMUNICATIONS;

EID: 84859385826     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.007243     Document Type: Article

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