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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1137-1139

Pulsed laser deposition of aluminum-doped ZnO films at 355 nm

(6) Holmelund, E a Schou, J a Thestrup, B a Tougaard, S b Johnson, E c Nielsen, M M a

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

b UNIVERSITY OF SOUTHERN DENMARK (Denmark)

c UNIVERSITY OF COPENHAGEN (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; EXCIMER LASERS; LASER BEAM EFFECTS; LATTICE CONSTANTS; LIGHT EMITTING DIODES; PULSED LASER DEPOSITION; SPECTROPHOTOMETERS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

FILM THICKNESS; MONOCHROMATIZATION; SHORT WAVELENGTH LASERS; TRANSPARENT FILMS;

METALLIC FILMS;

EID: 4344570961 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2663-5 Document Type: Conference Paper

Times cited : (10)

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