Atomic layer deposition of aluminum and titanium phosphates

Journal of Physical Chemistry C

Volumn 116, Issue 9, 2012, Pages 5920-5925

  Hämäläinen, Jani ^a   Holopainen, Jani ^a   Munnik, Frans ^b   Heikkilä, Mikko ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM PHOSPHATES; AMORPHOUS TITANIUM PHOSPHATE FILMS; ANNEALED FILMS; HIGH-TEMPERATURE XRD; METAL PHOSPHATES; OXYGEN SOURCES; PHOSPHORUS SOURCES; TITANIUM PHOSPHATE; TRIMETHYL PHOSPHATE;

ALUMINUM; AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; METAL HALIDES; PHOSPHORUS; THIN FILMS; TITANIUM;

ALUMINUM COATINGS;

EID: 84858139160     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp205222g     Document Type: Article

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