Self-assembled hybrid films of phosphotungstic acid and aminoalkoxysilanes on SiO 2/Si surfaces

Thin Solid Films

Volumn 520, Issue 9, 2012, Pages 3574-3580

  Souza, Adriano L ^a   Marques, Lygia A ^b   Eberlin, Marcos N ^b   Nascente, Pedro A P ^c   Herrmann Jr , Paulo S P ^d   Leite, Fabio L ^c   Rodrigues Filho, Ubirajara P ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

^c FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

^d BRAZILIAN CENTER FOR RESEARCH IN ENERGY AND MATERIALS CNPEM   (Brazil)

Author keywords

3 aminopropyltriethoxysilane; alkoxysilanes; Atomic force microscopy; N (3 (trimethoxysilyl) propyl) ethylenediamine; Phosphotungstic acid; Self assembled films; X ray photoelectron spectroscopy

Indexed keywords

3-AMINOPROPYLTRIETHOXYSILANE; ALKOXYSILANES; ATOMIC FORCE; PHOSPHOTUNGSTIC ACID; SELF ASSEMBLED FILMS;

ATOMIC FORCE MICROSCOPY; ORGANIC COMPOUNDS; PROTONATION; SILICON COMPOUNDS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILANES;

EID: 84857369172     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.069     Document Type: Article

References (43)

1. J. Sagiv J. Am. Chem. Soc. 102 1980 92
2. X. Zhong, R. Yuan, Y.Q. Chai, Y. Liu, J.Y. Dai, and D.P. Tang Sens. Actuators, B 104 2005 191
3. E.J. Llorent-Martínez, J.F. García-Reyes, P. Ortega-Barrales, and A. Molina-Díaz Anal. Bioanal. Chem. 382 2005 158
4. C.X. Lei, S.Q. Hu, N. Gao, G.L. Shen, and R.Q. Yu Bioelectrochemistry 65 2004 33
5. Y.Z. Fu, R. Yuan, L. Xu, Y.Q. Chai, Y. Liu, D.P. Tang, and Y. Zhang J. Biochem. Biophys. Meth. 62 2005 163
6. L.N. Xu, J.H. Liao, L. Huang, D.L. Ou, Z.R. Guo, H.Q. Zhang, C.W. Ge, N. Gu, and J.Z. Liu Thin Solid Films 434 2003 121
7. M. Geissler, H. Kind, P. Schmidt-Winkel, B. Michel, and E. Delamarche Langmuir 19 2003 6283
8. C.G. Wu, L.F. Tzeng, Y.T. Kuo, and C.H. Shu Appl. Catal., A 226 2002 199
9. E.P. Plueddemann 1982 Plenum New-York NY 31
10. T. Ogasawara, A. Yoshino, H. Okabayashi, and C.J. O'Connor Colloids Surf., A 180 2001 317
11. F. Beari, M. Brand, P. Jenkner, R. Lehnert, H.J. Metternich, J. Monkiewicz, and H.W. Siesler J. Organomet. Chem. 625 2001 208
12. H.L. Cabibil, V. Pham, J. Lozano, H. Celio, R.M. Winter, and J.M. White Langmuir 16 2000 10471
13. B.C. Bunker, R.W. Carpick, R.A. Assink, M.L. Thomas, M.G. Hankins, J.A. Voigt, D. Sipola, M.P. De Boer, and G.L. Gulley Langmuir 16 2000 7742
14. I. Shimizu, H. Okabayashi, N. Hattori, K. Taga, A. Yoshino, and C.J. O'Connor Colloid Polym. Sci. 275 1997 293
15. A. Kornherr, S. Hansal, W.E.G. Hansal, J.O. Besenhard, H. Kronberger, G.E. Nauer, and G. Zifferer J. Chem. Phys. 119 2003 9719
16. S. Fiorilli, P. Rivolo, E. Descrovi, C. Ricciardi, L. Pasquardini, L. Lunelli, L. Vanzetti, C. Pederzolli, B. Onida, and E. Garrone J. Colloid Interface Sci. 321 2008 235
17. B. Wu, G. Mao, and K.Y. Simon Ng Colloids Surf., A 162 1999 203
18. C.T. Cao, A.Y. Fadeev, and T.J. McCarthy Langmuir 17 2001 757
19. H. Watson, P.J. Mikkola, J.G. Matisons, and J.B. Rosenholm Colloids Surf., A 161 2000 183
20. G.C. Allen, F. Sorbello, C. Altavilla, A. Castorina, and E. Ciliberto Thin Solid Films 483 2005 306
21. J.S. Andresa, R.M. Reis, E.P. Gonzalez, L.S. Santos, M.N. Eberlin, P.A.P. Nascente, S.T. Tanimoto, S.A.S. Machado, and U.P. Rodrigues-Filho J. Colloid Interface Sci. 286 2005 303
22. Y. Ofir, N. Zenou, I. Goykhman, and S. Yitzchaik J. Phys. Chem. B 110 2006 8002
23. S.F. Wang, and D. Du Sens. Actuators, B 94 2003 282
24. M. Kinne, and M.A. Barteau Surf. Sci. 447 2000 105
25. S.Q. Liu, Z.Y. Tang, A.L. Bo, E.K. Wang, and S.J. Dong J. Electroanal. Chem. 458 1998 87
26. T. Auletta, F.C.J.M. van Veggel, and D.N. Reinhoudt Langmuir 18 2002 1288
27. F.L. Sousa, A.C.A.S. Ferreira, R.A.S. Ferreira, A.M.V. Cavaleiro, L.D. Carlos, H.I.S. Nogueira, J. Rocha, and T. Trindade J. Nanosci. Nanotechnol. 4 2004 214
28. L. Cheng, and J.A. Cox Chem. Mater. 14 2002 6
29. W.F. Bu, H.L. Fan, L.X. Wu, X.L. Hou, C.W. Hu, G. Zhang, and X. Zhang Langmuir 18 2002 6398
30. M.T. Pope Heteropoly and Isopoly Oxometalates 1983 Springer-Verlag New-York NY
31. D.E. Katsoulis Chem. Rev. 98 1998 359
32. E. Papaconstantinou Chem. Soc. Rev. 18 1989 1
33. L.S. Santos, C.H. Pavam, W.P. Almeida, F. Coelho, and M.N. Eberlin Angew. Chem. Int. Ed. 43 2004 4330
34. G. Leclerc, and J.J. Pireaux J. Electron. Spectrosc. Relat. Phenom. 71 1995 141
35. F.L. Leite, P.S.P. Herrmann, A.L. Da Róz, F.C. Ferreira, A.A.S. Curvelo, and L.H.C. Mattoso J. Nanosci. Nanotechnol. 6 2006 2354
36. F.L. Leite, M. de Oliveira Neto, L.G. Paterno, M.R.M. Ballestero, I. Polikarpov, Y.P. Mascarenhas, P.S.P. Herrmann, L.H.C. Mattoso, and O.N. Oliveira Jr. J. Colloid Interface Sci. 316 2007 376
37. K. Boussu, B. Van der Bruggen, A. Volodin, J. Snauwaert, C. Van Haesendonck, and C. Vandecasteele J. Colloid Interface Sci. 286 2005 632
38. F.L. Leite, L.G. Paterno, C.E. Borato, P.S.P. Herrmann, O.N. Oliveira Jr., and L.H.C. Mattoso Polymer 46 2005 12503
39. J.L. Magalhães, L.M. Moreira, U.P. Rodrigues, M.J. Giz, M.A. Pereira-da-Silva, R. Landers, R.C.G. Vinhas, and P.A.P. Nascente Surf. Interface Anal. 33 2002 293
40. J.F. Moulder, W.F. Sticke, P.E. Sobol, and K.D. Bombem Handbook of X-Ray Photoelectron Spectroscopy 1992 Perkin-Elmer Eden Prairie, MN
41. C. Blackledge, and J.D. McDonald Langmuir 15 1999 8119
42. G. Beamson, and D. Briggs 1992 Wiley New-York NY 227
43. W. Feng, T.R. Zhang, L. Wei, R. Lu, Y.B. Bai, T.J. Li, Y.Y. Zhao, and J.N. Yao Mater. Lett. 54 2002 309