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Volumn 286, Issue 1, 2005, Pages 303-309
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Adsorption of silanes bearing nitrogenated Lewis bases on SiO 2/Si (100) model surfaces
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Author keywords
3 Imidazolylpropyltrimethoxysilane; 4 (N Propyltriethoxysilane imino) pyridine; AFM; MALDI TOF MS; Self assembled thin films; Silicon dioxide; Silicon wafer; XPS
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Indexed keywords
AEROSOLS;
AGGLOMERATION;
GLASS;
MATHEMATICAL MODELS;
MONOLAYERS;
OXIDATION;
QUARTZ;
SELF ASSEMBLY;
SILANES;
SILICA;
SURFACE CHEMISTRY;
THIN FILMS;
THIN LAYER CHROMATOGRAPHY;
MODEL SYSTEMS;
NITROGENATED LEWIS BASES;
OXIDIZED SILICON WAFERS;
SELF-ASSEMBLED THIN FILMS;
ADSORPTION;
HETEROCYCLIC COMPOUND;
HISTAMINE;
HISTIDINE;
LEWIS BASE;
SILANE DERIVATIVE;
SILICON DIOXIDE;
TRANSITION ELEMENT;
ADSORPTION;
AFFINITY CHROMATOGRAPHY;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
CHEMICAL MODEL;
CHEMICAL REACTION;
FILM;
MATRIX ASSISTED LASER DESORPTION IONIZATION TIME OF FLIGHT MASS SPECTROMETRY;
METAL EXTRACTION;
NITRATION;
OXIDATION KINETICS;
PHASE TRANSITION;
PRIORITY JOURNAL;
REACTION ANALYSIS;
THIN LAYER CHROMATOGRAPHY;
X RAY POWDER DIFFRACTION;
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EID: 17744371164
PISSN: 00219797
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcis.2005.01.019 Document Type: Article |
Times cited : (10)
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References (32)
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