In situ stress relaxation and diffraction studies across the metal-insulator transition in epitaxial and polycrystalline SmNiO 3 thin films

Scripta Materialia

Volumn 66, Issue 7, 2012, Pages 463-466

  Viswanath, B ^a   Aydogdu, G H ^a   Ha, S D ^a   Ramanathan, S ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Metal insulator transition; Oxides; Phase transformation; Stress relaxation; Thin films

Indexed keywords

DIFFRACTION STUDIES; ELECTRICAL MEASUREMENT; EPITAXIAL THIN FILMS; EXPERIMENTAL OBSERVATION; IN-SITU; PHASE TRANSFORMATION; POLYCRYSTALLINE; STRESS CHANGES; SWITCHING DEVICES; TRANSITION BOUNDARIES;

EPITAXIAL GROWTH; OXIDES; STRESS RELAXATION; THIN FILMS;

SEMICONDUCTOR INSULATOR BOUNDARIES;

EID: 84857120935     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2011.12.018     Document Type: Article

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