Effect of tensile and compressive strains on the transport properties of SmNiO3 layers epitaxially grown on (001) SrTiO3 and LaAlO3 substrates

Applied Physics Letters

Volumn 91, Issue 19, 2007, Pages

  Conchon, Florine ^a   Boulle, Alexandre ^a   Guinebretìre, Reń ^a   Girardot, Ćcile ^c   Pignard, St́phane ^c   Kreisel, Jens ^c   Weiss, Fraņois ^c   Dooryh́e, Eric ^b   Hodeau, Jean Louis ^b  

^a UNIVERSITY OF LIMOGES   (France)

^b LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; EPITAXIAL GROWTH; LANTHANUM COMPOUNDS; METAL INSULATOR TRANSITION; OXYGEN VACANCIES; SUBSTRATES; TENSILE STRESS;

HIGH RESOLUTION X RAY DIFFRACTION; IN PLANE COMPRESSIVE STRAIN;

SEMICONDUCTING SAMARIUM COMPOUNDS;

EID: 36048984041     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2800306     Document Type: Article

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