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Journal of Applied Physics

Volumn 109, Issue 12, 2011, Pages

Epitaxy, strain, and composition effects on metal-insulator transition characteristics of SmNiO3 thin films

(4) Aydogdu, Gulgun H a Ha, Sieu D a Viswanath, B a Ramanathan, Shriram a

a HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BROAD TEMPERATURE RANGES; COMPRESSIVE STRAIN; FILM STRUCTURE; INSULATOR METAL TRANSITION; INSULATOR-TO-METAL TRANSITIONS; LAO SUBSTRATE; MISMATCH STRAIN; NICKEL OXIDATION; OUT-OF-PLANE; RESISTANCE BEHAVIORS; RESISTANCE MEASUREMENT; RF-MAGNETRON SPUTTERING; SEMICONDUCTING BEHAVIOR; SI SUBSTRATES; SRLAALO; SRTIO; THICKNESS DEPENDENCE;

COMPOSITION EFFECTS; EPITAXIAL FILMS; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; METAL INSULATOR BOUNDARIES; SAPPHIRE; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR INSULATOR BOUNDARIES; SUBSTRATES; TENSILE STRAIN;

METAL INSULATOR TRANSITION;

EID: 79960198669 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3598055 Document Type: Article

Times cited : (38)

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