Flow field characterization in a vertically oriented cold wall CCVD reactor by particle image velocimetry

Chemical Engineering Journal

Volumn 184, Issue , 2012, Pages 315-325

  Reinhold López, Karla ^a   Braeuer, Andreas ^a   Schmitt, Adeliene ^a   Popovska Leipertz, Nadejda ^a,b   Leipertz, Alfred ^a,b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b Energie und Systemtechnik GmbH   (Germany)

Author keywords

Carbon nanotubes (CNTs); Catalytic chemical vapor deposition (CCVD); Cold wall reactor; Flow field; Particle image velocimetry (PIV)

Indexed keywords

AXIAL PROFILES; CATALYTIC CHEMICAL VAPOR DEPOSITION; COLD WALL; FEED FLOWS; FIELD CHARACTERIZATION; GAS TEMPERATURE; OPERATION CONDITIONS; PARTICLE IMAGE VELOCIMETRIES; PARTICLE IMAGE VELOCIMETRY (PIV); PIV MEASUREMENTS; QUANTITATIVE INFORMATION; RESIDENCE TIME; SUBSTRATE SURFACE; THERMOPHORETIC FORCE; VELOCITY COMPONENTS; VOLUMETRIC FLOW RATE;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; FLOW FIELDS; REYNOLDS NUMBER; VELOCIMETERS; VELOCITY MEASUREMENT;

FLOW VISUALIZATION;

EID: 84857031129     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2012.01.062     Document Type: Article

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