Experiment and simulation of the recirculation flow in a CVD reactor for monolithic materials

Experimental Thermal and Fluid Science

Volumn 12, Issue 1, 1996, Pages 45-51

  Gong, S C ^a   Liu, R G ^a   Chou, F C ^a   Chiang, A S T ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

CVD reactor; Flow visualization; High expansion ratio; Reattachment length

Indexed keywords

CHEMICAL; FLOW; REACTORS; RECIRCULATION; VAPOUR DEPOSITION;

CHANNEL FLOW; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CORRELATION METHODS; EXPANSION; EXPERIMENTS; FLOW PATTERNS; JETS; REYNOLDS NUMBER; VELOCITY;

EXPANSION RATIO; RECIRCULATION FLOW;

FLOW OF FLUIDS;

EID: 18544409583     PISSN: 08941777     EISSN: None     Source Type: Journal    
DOI: 10.1016/0894-1777(95)00067-4     Document Type: Article

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