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Thin Solid Films

Volumn 409, Issue 1, 2002, Pages 88-97

Investigation of an upflow cold-wall CVD reactor by gas phase Raman spectroscopy

(4) Park, Chinho a Yeon Hwang, Jang b Huang, Min b Anderson, Timothy J b

a Sch of Chem Eng and Technology (South Korea)

b University of Florida (United States)

Author keywords

Chemical vapor deposition; Gas phase Raman spectroscopy; Stagnation point flow reactor; Two dimensional axisymmetric model

Indexed keywords

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; HEAT TRANSFER; RAMAN SPECTROSCOPY; SURFACE STRUCTURE;

STAGNATION POINT FLOW REACTORS;

CHEMICAL REACTORS;

EID: 0037156065 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00109-8 Document Type: Conference Paper

Times cited : (6)

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