Thermal conductivity measurement of thermally-oxidized SiO2 films on a silicon wafer using a thermo-reflectance technique

International Journal of Thermophysics

Volumn 26, Issue 1, 2005, Pages 179-190

  Kato, R ^a   Hatta, I ^b  

^a Ulvac Riko Inc   (Japan)

^b FUKUI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Periodic method; Silicon dioxide; Thermal conductivity; Thermo reflectance; Thin film

Indexed keywords

HEAT CONDUCTION; OXIDATION; SILICA; SILICON WAFERS; THERMAL INSULATING MATERIALS; THIN FILMS;

PERIODIC METHOD; THERMAL CONDUCTION EQUATION; THERMAL EFFUSIVITY; THERMO-REFLECTANCE;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 17444381106     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10765-005-2365-z     Document Type: Article

References (8)

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