In situ study of the deposition of (ultra)thin organic phosphonic acid layers on the oxide of aluminum

Langmuir

Volumn 28, Issue 6, 2012, Pages 3167-3173

  Hauffman, Tom ^a   Van Lokeren, Luk ^a   Willem, Rudolph ^a   Hubin, Annick ^a   Terryn, Herman ^a  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION TIME; ALUMINUM OXIDES; BEARING RATIO; DOSY NMR; EQUIVALENT THICKNESS; EX SITU; FREE MOLECULES; IN-SITU; IN-SITU ANALYSIS; IN-SITU STUDY; ISLAND GROWTH; ISLANDS GROWTH; LAYER FORMATION; OXIDE SUBSTRATES; OXIDE SURFACE; PHOSPHONIC ACIDS; SELF-ASSEMBLING MONOLAYERS;

ADSORPTION; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; MONOLAYERS; ORGANIC ACIDS;

ALUMINUM COATINGS;

ALUMINUM OXIDE; PHOSPHONIC ACID DERIVATIVE;

ADSORPTION; ARTICLE; CHEMISTRY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SURFACE PROPERTY;

ADSORPTION; ALUMINUM OXIDE; MAGNETIC RESONANCE SPECTROSCOPY; PHOSPHONIC ACIDS; SURFACE PROPERTIES;

EID: 84856920622     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la203988m     Document Type: Article

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