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Volumn 379, Issue 4, 2004, Pages 646-652
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Characterization of the adsorption of ω-(thiophene-3-yl alkyl) phosphonic acid on metal oxides with AR-XPS
a
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Author keywords
Chemical shift; Phosphonic acid; Self assembled monolayer; XPS
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Indexed keywords
ADHESION;
ADSORPTION;
ALUMINUM;
CHEMICAL BONDS;
COATINGS;
ETHANOL;
NANOSTRUCTURED MATERIALS;
ORGANIC ACIDS;
SILICON WAFERS;
SOLUTIONS;
TANTALUM;
X RAY PHOTOELECTRON SPECTROSCOPY;
ADHESION PROMOTERS;
CHEMICAL SHIFT;
PHOSPHONIC ACID;
STRUCTURAL CHEMISTRY;
SELF ASSEMBLY;
11 (THIOPHENE 3 YL UNDECYL) PHOSPHONIC ACID;
11-(THIOPHENE-3-YL UNDECYL) PHOSPHONIC ACID;
2 (THIOPHENE 3 YL ETHYL) PHOSPHONIC ACID;
2-(THIOPHENE-3-YL ETHYL) PHOSPHONIC ACID;
6 (THIOPHENE 3 YL HEXYL) PHOSPHONIC ACID;
6-(THIOPHENE-3-YL HEXYL) PHOSPHONIC ACID;
ALUMINUM OXIDE;
OXIDE;
PHOSPHONIC ACID DERIVATIVE;
SILICON;
TANTALUM;
TANTALUM OXIDE;
THIOPHENE DERIVATIVE;
TITANIUM;
TITANIUM DIOXIDE;
ADSORPTION;
ARTICLE;
CHEMICAL STRUCTURE;
CHEMISTRY;
MATERIALS TESTING;
METHODOLOGY;
RADIATION SCATTERING;
SPECTROMETRY;
SURFACE PROPERTY;
ADSORPTION;
ALUMINUM OXIDE;
MATERIALS TESTING;
MODELS, MOLECULAR;
MOLECULAR STRUCTURE;
OXIDES;
PHOSPHONIC ACIDS;
SCATTERING, RADIATION;
SILICON;
SPECTROMETRY, X-RAY EMISSION;
SURFACE PROPERTIES;
TANTALUM;
THIOPHENES;
TITANIUM;
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EID: 21044436142
PISSN: 16182642
EISSN: None
Source Type: Journal
DOI: 10.1007/s00216-004-2634-x Document Type: Conference Paper |
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Times cited : (94)
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References (20)
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