Electrically conducting nanopatterns formed by chemical e-beam lithography via gold nanoparticle seeds

Langmuir

Volumn 28, Issue 5, 2012, Pages 2448-2454

  Schaal, Patrick A ^a   Besmehn, Astrid ^b   Maynicke, Eva ^c   Noyong, Michael ^a   Beschoten, Bernd ^c   Simon, Ulrich ^a  

^a Institute of Inorganic Chemistry   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

E-BEAM LITHOGRAPHY; ELECTRICAL DEVICES; GOLD NANOPARTICLES; HEAD GROUPS; NANO PATTERN; PROOF OF CONCEPT; SULFONIC ACID; THIOL GROUPS; TOPDOWN;

BINDING SITES; ELECTRON BEAM LITHOGRAPHY; GOLD; NANOPARTICLES;

SILICON WAFERS;

GOLD; NANOMATERIAL; SILICON; THIOL DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; ELECTRIC CONDUCTIVITY; PARTICLE SIZE; SURFACE PROPERTY;

ELECTRIC CONDUCTIVITY; GOLD; MOLECULAR STRUCTURE; NANOSTRUCTURES; PARTICLE SIZE; SILICON; SULFHYDRYL COMPOUNDS; SURFACE PROPERTIES;

EID: 84856734755     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la204393h     Document Type: Article

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