Role of RuO 3 for the formation of RuO 2 nanorods

Applied Physics Letters

Volumn 100, Issue 3, 2012, Pages

  Music, Denis ^a   Breunung, Johannes ^a   Mrz, Stanislav ^a   Schneider, Jochen M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; ADSORPTION DATA; AR PLASMAS; EHRLICH-SCHWOEBEL BARRIER; EXPERIMENTAL DATA; NANOROD FORMATION; NUCLEATION SITES; THREE-DIMENSIONAL GROWTH;

ADSORPTION; ENERGY MANAGEMENT; NANORODS; RUTHENIUM ALLOYS;

RUTHENIUM COMPOUNDS;

EID: 84856434219     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3677665     Document Type: Article

References (27)

1. Y. Xia, P. Yang, Y. Sun, Y. Wu, B. Mayers, B. Gates, Y. Yin, F. Kim, and H. Yan, Adv. Mater. 15, 353 (2003). 10.1002/adma.200390087
2. J. V. Ryan, A. D. Berry, M. L. Anderson, J. W. Long, R. M. Stroud, V. M. Cepak, V. M. Browning, D. R. Rolison, and C. I. Merzbacher, Nature 406, 169 (2000). 10.1038/35018040 (Pubitemid 30468994)
3. C.-S. Hsieh, D.-S. Tsai, R.-S. Chen, and Y.-S. Huang, Appl. Phys. Lett. 85, 3860 (2004). 10.1063/1.1812373
4. Y.-T. Lin, C.-Y. Chen, C.-P. Hsiung, K.-W. Cheng, and J.-Y. Gan, Appl. Phys. Lett. 89, 063123 (2006). 10.1063/1.2269180 (Pubitemid 44222976)
5. Y.-L. Chueh, C.-H. Hseih, M.-T. Chang, L.-J. Chou, C. S. Lao, J. H. Song, J.-Y. Gan, and Z. L. Wang, Adv. Mater. 19, 143 (2007). 10.1002/adma.v19:1
6. D. Music, F. H.-U. Basse, R. Hadorf, and J. M. Schneider, J. Appl. Phys. 108, 013707 (2010). 10.1063/1.3452380
7. M. Hiratani, Y. Matsui, K. Imagawa, and S. Kimura, Thin Solid Films 366, 102 (2000). 10.1016/S0040-6090(99)01111-6
8. M. W. Cross, W. J. Varhue, D. L. Hitt, and E. Adams, Nanotechnology 19, 045611 (2008). 10.1088/0957-4484/19/04/045611
9. D. Ferizovi, L. K. Hussey, Y.-S. Huang, and M. Muoz, Appl. Phys. Lett. 94, 131913 (2009). 10.1063/1.3115030
10. Y. Kaga, Y. Abe, H. Yanagisawa, and K. Sasaki, Jpn. J. Appl. Phys. 37, 3457 (1998). 10.1143/JJAP.37.3457
11. M. H. Kim, J. M. Baik, S. J. L. H.-Y. Shin, J. Lee, S. Yoon, G. D. Stucky, M. Moskovits, and A. M. Wodtke, Appl. Phys. Lett. 96, 213108 (2010). 10.1063/1.3435475
12. C. C. Hsu, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 24, 1 (2006). 10.1116/1.2121751 (Pubitemid 43006833)
13. Y. Abe, Y. Kaga, M. Kawamura, and K. Sasaki, J. Vac. Sci. Technol. B 18, 1348 (2000). 10.1116/1.591385
14. D. Benzeggouta, M. C. Hugon, and J. Bretagne, Plasma Sources Sci. Technol. 18, 045026 (2009). 10.1088/0963-0252/18/4/045026
15. I. Petrov, A. Myers, J. E. Greene, and J. R. Abelson, J. Vac. Sci. Technol. A 12, 2846 (1994). 10.1116/1.578955 (Pubitemid 24823854)
16. S. Mrz and J. M. Schneider, Appl. Phys. Lett. 89, 051502 (2006). 10.1063/1.2266888 (Pubitemid 44350217)
17. S. Mrz and J. M. Schneider, J. Appl. Phys. 100, 023503 (2006). 10.1063/1.2216354 (Pubitemid 44183349)
18. T. Ozaki and H. Kino, Phys. Rev. B 72, 045121 (2005). 10.1103/PhysRevB.72.045121 (Pubitemid 41526551)
19. P. Hohenberg and W. Kohn, Phys. Rev. 136, B864 (1964). 10.1103/PhysRev.136.B864
20. T. Ozaki, Phys. Rev. B 67, 155108 (2003). 10.1103/PhysRevB.67.155108
21. N. Troullier and J. L. Martins, Phys. Rev. B 43, 1993 (1991). 10.1103/PhysRevB.43.1993
22. P. E. Blchl, Phys. Rev. B 41, 5414 (1990). 10.1103/PhysRevB.41.5414
23. J. P. Perdew, K. Burke, and M. Ernzerhof, Phys. Rev. Lett. 77, 3865 (1996). 10.1103/PhysRevLett.77.3865
24. D. Music, F. H.-U. Basse, and J. M. Schneider, Cryst. Growth Des. 10, 4531 (2010). 10.1021/cg1008297
25. J. M. Soler, E. Artacho, J. D. Gale, A. Garcia, J. Junquera, P. Ordejon, and D. Sanchez-Portal, J. Phys.: Condens. Matter 14, 2745 (2002). 10.1088/0953-8984/14/11/302 (Pubitemid 34288362)
26. S.-C. Li, Y. Han, J.-F. Jia, Q.-K. Xue, and F. Liu, Phys. Rev. B 74, 195428 (2006). 10.1103/PhysRevB.74.195428 (Pubitemid 44808171)
27. S. K. Xiang and H. Huang, Appl. Phys. Lett. 92, 101923 (2008). 10.1063/1.2891106 (Pubitemid 351393919)