Growth of RuO2 thin films by pulsed-laser deposition

Thin Solid Films

Volumn 366, Issue 1-2, 2000, Pages 102-106

  Hiratani, Masahiko ^a   Matsui, Yuichi ^a   Imagawa, Kazushige ^a   Kimura, Shinichiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTALLOGRAPHY; DIELECTRIC MATERIALS; LASER ABLATION; PRESSURE EFFECTS; RUTHENIUM COMPOUNDS; SILICON; SINTERING; SUBSTRATES; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

OXYGEN PRESSURE; PULSED LASER DEPOSITION; RUTHENIUM DIOXIDE; SINTERED OXIDE TARGET;

THIN FILMS;

EID: 0034188122     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01111-6     Document Type: Article

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